X-ray standing wave study of wet-etch sulphur-treated InP(100) surfaces

Applied Surface Science

Volumn 166, Issue 1, 2000, Pages 196-200

  McGovern, I T ^a   Koebbel, A ^a   Leslie, A ^a   Dudzik, E ^a   Mitchell, C E J ^b   McLean, A B ^b   Patchett, A ^f   Zahn, D R T ^f   Evans, D A ^c   Woodruff, D P ^d   Cowie, B C C ^e  

^a TRINITY COLLEGE DUBLIN   (Ireland)

^b QUEEN S UNIVERSITY   (Canada)

^c ABERYSTWYTH UNIVERSITY   (United Kingdom)

^d UNIVERSITY OF WARWICK   (United Kingdom)

^e DARESBURY LABORATORY   (United Kingdom)

^f NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DATA REDUCTION; DIMERS; ETCHING; INTERFACES (MATERIALS); MATHEMATICAL MODELS; PASSIVATION; SULFUR; SURFACE TREATMENT; SYNCHROTRON RADIATION; VACUUM APPLICATIONS;

WET-ETCH SULPHUR TREATED SURFACES; X-RAY STANDING WAVES;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0034300371     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00413-X     Document Type: Article

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