Thin Ag film formation onto Si/SiO2 substrate

Applied Surface Science

Volumn 166, Issue 1, 2000, Pages 160-164

  Iida, S ^a   Okui, T ^a   Tai, T ^a   Akao, S ^b  

^a OSAKA SANGYO UNIVERSITY   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DIELECTRIC RELAXATION; ELECTROMIGRATION; LEAKAGE CURRENTS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SILICA; SILVER; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DIRECT CURRENT METHOD; ION BEAM DEPOSITION METHOD;

SEMICONDUCTING FILMS;

EID: 0034300317     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00400-1     Document Type: Article

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