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Volumn 35, Issue 19, 2000, Pages 4789-4794
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Effects of deposition temperature and pressure of the surface roughness and the grain size of polycrystalline Si1-xGex films
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
GRAIN SIZE AND SHAPE;
POLYCRYSTALLINE MATERIALS;
SUPERCONDUCTING TRANSITION TEMPERATURE;
SURFACE ROUGHNESS;
DEPOSITION TEMPERATURES;
SEMICONDUCTING FILMS;
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EID: 0034299236
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1004868627888 Document Type: Article |
Times cited : (14)
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References (16)
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