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Volumn 35, Issue 19, 2000, Pages 4789-4794

Effects of deposition temperature and pressure of the surface roughness and the grain size of polycrystalline Si1-xGex films

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; GRAIN SIZE AND SHAPE; POLYCRYSTALLINE MATERIALS; SUPERCONDUCTING TRANSITION TEMPERATURE; SURFACE ROUGHNESS;

EID: 0034299236     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004868627888     Document Type: Article
Times cited : (14)

References (16)
  • 16
    • 0004205669 scopus 로고
    • edited by J. Allen Kluwer Academic Publishers, Norwell, MA, The Kluwer International Series in Engineering and Computer Science
    • T. I. KAMINS, in "Polycrystalline Silicon for Integrated CircuitApplications," edited by J. Allen (Kluwer Academic Publishers, Norwell, MA, 1988). The Kluwer International Series in Engineering and Computer Science.
    • (1988) Polycrystalline Silicon for Integrated CircuitApplications
    • Kamins, T.I.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.