Atomic force microscopy and ellipsometry study of the nucleation and growth mechanism of polycrystalline silicon films on silicon dioxide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2466-2479

  Basa, C ^a   Tinani, M ^a   Irene, E A ^a  

^a University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032356925     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581368     Document Type: Article

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