Plasma injection with helicon sources

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2108-2115

  Chen, Francis F ^a   Jiang, Xicheng ^a   Evans, John D ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; HELICONS; MAGNETIC FIELD EFFECTS; PLASMA DENSITY;

HELICON DISCHARGES; PLASMA INJECTION;

PLASMA SOURCES;

EID: 0034275221     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1289537     Document Type: Article

References (9)

1. G. R. Tynan, A. D. Bailey III, G. A. Campbell, R. Charatan, A. de Chambrier, G. Gibson, D. J. Hemker, K. Jones, A. Kuthi, C. Lee, T. Shoji, and M. Wilcoxson, J. Vac. Sci. Technol. A 15, 2885 (1997).
2. F. F. Chen, X. Jiang, J. D. Evans, G. Tynan, and D. Arnush, Plasma Phys. Controlled Fusion 39, A411 (1997).
3. F. F. Chen and J. D. Evans, Proc. Plasma Etch Users Group, NCCAVS, 150 W. Iowa Ave., Suite 104, Sunnyvale, CA 94086 (1998).
4. F. F. Chen, J. Vac. Sci. Technol. A 10, 1389 (1992).
5. D. G. Miljak and F. F. Chen, Plasma Sources Sci. Technol. 7, 61 (1998).
6. D. Arnush and F. F. Chen, Phys. Plasmas 5, 1239 (1998).
7. I. D. Sudit and F. F. Chen, Plasma Sources Sci. Technol. 5, 43 (1996).
8. F. F. Chen, X. Jiang, and J. D. Evans, UCLA LTP-907 (1999); www.ee.ucla.edu/faculty/Chen.html
9. H. S. Carslaw and J. C. Jaeger, Conduction of Heat in Solids (Oxford University Press, New York, 1959), pp. 214-215.