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Volumn 274, Issue 1, 2000, Pages 282-288

Effects of MeV energy titanium ion implants on the oxygen related defects centers in silica

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; ION IMPLANTATION; LIGHT ABSORPTION; POSITIVE IONS; TITANIUM;

EID: 0034274240     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(00)00191-5     Document Type: Article
Times cited : (4)

References (31)
  • 15
    • 0002551537 scopus 로고
    • in: J. Zarzychi (Ed.), VCH, Weinheim, and references therin
    • R.A. Weeks, in: J. Zarzychi (Ed.), Materials Science and Technology, vol. 9, VCH, Weinheim, 1991, p. 331 and references therin.
    • (1991) Materials Science and Technology , vol.9 , pp. 331
    • Weeks, R.A.1
  • 29
    • 0002853246 scopus 로고
    • in: D.R. Uhlmann, N.J. Kreidl (Eds.), American Ceramic Society, Westerville, OH
    • E.J. Friebele, in: D.R. Uhlmann, N.J. Kreidl (Eds.), Optical Properties of Glass, American Ceramic Society, Westerville, OH, 1991, p. 205.
    • (1991) Optical Properties of Glass , pp. 205
    • Friebele, E.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.