Development of edge field emission cold cathodes based on low work function Cu-Li alloy coatings

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2427-2432

  Tucek, J C ^a   Krauss, A R ^a   Gruen, D M ^a   Auciello, O ^a   Moldovan, N ^a   Mancini, D C ^a   Zurn, S ^b   Polla, D ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER ALLOYS; ELECTRON EMISSION; HOLE TRAPS; MAGNETRON SPUTTERING; MONOLAYERS; OPTICAL COATINGS; OPTICAL FILMS; REACTIVE ION ETCHING; SPUTTER DEPOSITION; THIN FILMS;

FOWLER-NORDHEIM PLOT THEORY; MICROTIP ARRAYS;

FIELD EMISSION CATHODES;

EID: 0034268582     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1308600     Document Type: Article

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