Fabrication of gated SiC vertical edge emitters by chemical mechanical polishing

Journal of Micromechanics and Microengineering

Volumn 7, Issue 2, 1997, Pages 37-43

  Busta, Heinz H ^a  

^a SARNOFF CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; ELECTRON EMISSION; MICROMACHINING;

VERTICAL EDGE EMITTERS;

MICROELECTRONIC PROCESSING;

EID: 0031168651     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/2/001     Document Type: Article

References (7)

1. Brodie I and Spindt C A 1992 Adv. Electron. Electron Phys. 83 1
2. Busta H H 1992 J. Micromech. Microeng. 2 42
3. Levine J D 1996 J. Vac. Sci. Technol. B 14 2008
4. Fleming J G, Ohlberg D A A, Felter T and Malinowski M 1996 J. Vac. Sci. Technol. B 14 1958
5. Busta H, Gammie G, Skala S, Pogemiller J, Nowicki R, Hubacek J, Devine D, Rao R and Urbanek W 1995 Technical Digest IEDM 405
6. Hsu D S Y and Gray H F 1995 Technical Digest 8th Int. Vacuum Microelectr. Conf. (Portland OR) 257
7. Nowicki R S, Busta H H, Pogemiller J E, Forouhi A R, Bloomer I, Clift W M, Yio J L and Felter T 1996 Technical Digest 9th Int. Vacuum Microelect. Conf. (St Petersburg) 184