Fractality aspects during agglomeration of solid-phase-epitaxy Co-silicide thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2472-2476

  Palasantzas, G ^a   De Hosson, J Th M ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; AGGREGATES; ANISOTROPY; COBALT COMPOUNDS; COMPUTATIONAL COMPLEXITY; EPITAXIAL GROWTH; FILM GROWTH; FRACTALS; IN SITU PROCESSING; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; THIN FILMS;

SOLID-PHASE-EPITAXY THIN FILMS;

METALLIC FILMS;

EID: 0034264642     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1312262     Document Type: Article

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