Magnetoresistance of Co100-xFex/Al-oxide/Co100-xFex tunnel junctions

IEEE Transactions on Magnetics

Volumn 36, Issue 5, 2000, Pages 2812-2814

  Nakashio, E ^a   Sugawara, J ^a   Onoe, S ^a   Kumagai, S ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Bias dependence; CoFe alloy; Geometrical enhanced MR; ICP oxidation and tunnel junction

Indexed keywords

ANNEALING; COBALT COMPOUNDS; TUNNEL JUNCTIONS;

GEOMETRICAL ENHANCED MAGNETORESISTANCE;

MAGNETORESISTANCE;

EID: 0034260707     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.908597     Document Type: Article

References (13)