Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques

IEEE Transactions on Magnetics

Volumn 36, Issue 5 I, 2000, Pages 3495-3498

  Yamaguchi, M ^a,b   Baba, M ^b   Suezawa, K ^b   Moizumi, T ^c   Arai, K I ^a,b   Haga, A ^c   Shimada, Y ^b   Tanabe, S ^d   Itoh, K ^d  

^a IEEE   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c TOHOKU GAKUIN UNIVERSITY   (Japan)

^d MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Complex permeability; Inductance; Microfabrication; Planarization; Quality factor; RF integrated inductor

Indexed keywords

INDUCTANCE; MAGNETIC THIN FILMS; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; NATURAL FREQUENCIES; Q FACTOR MEASUREMENT; SURFACE ROUGHNESS;

MAGNETIC THIN-FILM INDUCTORS; SLIT PATTERNS; SURFACE PLANARIZATION;

ELECTRIC INDUCTORS;

EID: 0034260672     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.908872     Document Type: Article

References (5)

1. Microfabrication and characteristics of magnetic thin-film inductors for 1 GHz-drive mobile communication handset applications
2. FEM analysis of thin-film inductors used in GHz frequency bands
3. Metal-metal amorphous materials with soft magnetic properties
4. Magnetic thin-film inductors for rf integrated circuits
5. Micro-patterned soft magnetic films for UHF applications