Oxidation process of an Al micro-cluster

Applied Surface Science

Volumn 162, Issue , 2000, Pages 435-439

  Hoshino, T ^a   Sekino, A ^a   Hata, M ^a   Tsuda, M ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC DENSITY OF STATES; GROUND STATE; OXIDATION; OXYGEN; POTENTIAL ENERGY; QUANTUM THEORY;

FIRST-PRINCIPLES CALCULATION; MICRO-CLUSTER;

ALUMINUM;

EID: 0034250884     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00229-4     Document Type: Article

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