Selective growth of porous silicon on focused ion beam patterns

Journal of the Electrochemical Society

Volumn 147, Issue 8, 2000, Pages 2993-2998

  Spiegel, A ^a   Erickson, L E ^b   Schmukia, P ^a  

^a EPFL   (Switzerland)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ION BEAMS; ION IMPLANTATION; LIGHT POLARIZATION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; POROUS SILICON; RAMAN SPECTROSCOPY; SEMICONDUCTOR GROWTH;

ELECTROCHEMICAL POLARIZATION;

SEMICONDUCTING SILICON;

EID: 0034248279     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393637     Document Type: Article

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