Novel STM-based depth profiling technique for the electronic characterization of thin film materials

Applied Surface Science

Volumn 162, Issue , 2000, Pages 630-637

  Fan, Y ^a   Fitzgerald, A G ^a   Cairns, J A ^a   John, P ^b   Troupe, C E ^b   Wilson, J I B ^b  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

^b HERIOT WATT UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ETCHING; ION IMPLANTATION; SCANNING TUNNELING MICROSCOPY; SPECTROSCOPY; SURFACE TREATMENT; THIN FILMS;

DEPTH PROFILING; SCANNING TUNNELING SPECTROSCOPY; SURFACE MODIFICATION;

SEMICONDUCTING FILMS;

EID: 0034248269     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00262-2     Document Type: Article

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