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Journal of Materials Science

Volumn 35, Issue 16, 2000, Pages 4093-4098

Hydrogen reduction of a RuO2 electrode prepared by DC reactive sputtering

(3) Matsui, Y a Hiratani, M a Kimura, S a

a HITACHI LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CRACKING (CHEMICAL); DEPOSITION; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; HYDROGEN; INTERFACES (MATERIALS); OXIDATION; REDUCTION; SPUTTERING; STRENGTH OF MATERIALS; THIN FILMS;

HYDROGEN REDUCTION; RUTHENIUM DIOXIDE; THERMODYNAMIC EQUILIBRIUM;

RUTHENIUM COMPOUNDS;

EID: 0034246949 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/A:1004894522975 Document Type: Article

Times cited : (12)

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