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Volumn 39, Issue 8 B, 2000, Pages

Correlation between photoluminescence intensity and micro structure in amorphous silicon films prepared by reactive RF sputtering

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CORRELATION METHODS; DEFECTS; HYDROGENATION; MICROSTRUCTURE; PHOTOLUMINESCENCE; SPUTTERING;

EID: 0034245002     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l844     Document Type: Article
Times cited : (8)

References (16)
  • 9
    • 0021547057 scopus 로고
    • ed. J. I. Pankove Academic Press, New York
    • R. A. Street: Semiconductor & Semimetals, ed. J. I. Pankove (Academic Press, New York, 1984) Vol. 21, Pt. B, p. 197.
    • (1984) Semiconductor & Semimetals , vol.21 , Issue.PART B , pp. 197
    • Street, R.A.1
  • 11
    • 0021658879 scopus 로고
    • ed. J. I. Pankove Academic Press, New York
    • T. D. Moustakas: Semiconductor & Semimetals, ed. J. I. Pankove (Academic Press, New York, 1984) Vol. 21, Pt. A, p. 55.
    • (1984) Semiconductor & Semimetals , vol.21 , Issue.PART A , pp. 55
    • Moustakas, T.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.