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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 8, 2000, Pages 4707-4711

Structural properties of p-type microcrystalline silicon as a window layer of solar cells

(3) Sasaki, Toshiaki a Fujikake, Shinji a Ichikawa, Yukimi a

a FUJI ELECTRIC CO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON;

SILICON SOLAR CELLS;

EID: 0034244981 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.4707 Document Type: Article

Times cited : (1)

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