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Volumn 47, Issue 7, 2000, Pages 1426-1430

1/f noise model of fully overlapped lightly doped drain MOSFET

Author keywords

[No Author keywords available]

Indexed keywords

LIGHTLY DOPED DRAIN MOSFET; VOLTAGE DROP;

EID: 0034227939     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.848287     Document Type: Article
Times cited : (9)

References (12)
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    • Li, X.1    Vandamme, L.K.J.2
  • 2
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    • Cut-off frequency and transit time of lightly doped drain (LDD) MOSFETs
    • C. Thomas et al., "Cut-off frequency and transit time of lightly doped drain (LDD) MOSFETs," MicroelectronRehab., vol. 38, pp. 1955-1961, 1998.
    • (1998) MicroelectronRehab. , vol.38 , pp. 1955-1961
    • Thomas, C.1
  • 3
    • 0004360165 scopus 로고    scopus 로고
    • Submicrometer lightly doped drain (LDD) MOSFET: An optimized model for very high cut off frequencies
    • C. Thomas, S. Haldar, M. Khanna, and R. S. Gupta, "Submicrometer lightly doped drain (LDD) MOSFET: An optimized model for very high cut off frequencies," in Proc. Asia Pacific Microwave Conf. New Delhi, 1996, pp. 139-142.
    • (1996) Proc. Asia Pacific Microwave Conf. New Delhi , pp. 139-142
    • Thomas, C.1    Haldar, S.2    Khanna, M.3    Gupta, R.S.4
  • 4
    • 0026938662 scopus 로고
    • 1/f noise in series resistance of LDD MOSTs
    • X. Li and L. K. J. Vandamme, "1/f noise in series resistance of LDD MOSTs," Solid-State Electron., vol. 35, pp. 1471-1475, 1992.
    • (1992) Solid-State Electron. , vol.35 , pp. 1471-1475
    • Li, X.1    Vandamme, L.K.J.2
  • 5
    • 0022957159 scopus 로고
    • A novel submicron LDD transistor with inverse-T gate structure
    • T.-Y. Huang et al., "A novel submicron LDD transistor with inverse-T gate structure," in IEDM TechDig., 1986, pp. 742-745.
    • (1986) IEDM TechDig. , pp. 742-745
    • Huang, T.-Y.1
  • 6
    • 0022238238 scopus 로고
    • An accurate mobility model for the I-V characteristics of n-channel enhancement-mode MOSFET's with single-channel boron implantation
    • C. Y. Wu and Y. W. Daih, "An accurate mobility model for the I-V characteristics of n-channel enhancement-mode MOSFET's with single-channel boron implantation," Solid-State Electron., vol. 28, pp. 1271-1278, 1985.
    • (1985) Solid-State Electron. , vol.28 , pp. 1271-1278
    • Wu, C.Y.1    Daih, Y.W.2
  • 7
    • 0022237493 scopus 로고
    • Study of 1/f noise in N-MOSFETs: Linear region
    • Dec.
    • Z. Celik and T. Y. Hsiang, "Study of 1/f noise in N-MOSFETs: Linear region," IEEE Trans. Electron Devices, vol. ED-32, p. 2797, Dec. 1985.
    • (1985) IEEE Trans. Electron Devices , vol.ED-32 , pp. 2797
    • Celik, Z.1    Hsiang, T.Y.2
  • 8
    • 0032672648 scopus 로고    scopus 로고
    • A new analytical model to determine the drain-source series resistance of FOLD MOSFET
    • A. Kumar, E. Kalra, S. Haldar, and R. S. Gupta, "A new analytical model to determine the drain-source series resistance of FOLD MOSFET," Semicond. Sci. Technol., vol. 14, pp. 489-495, 1999.
    • (1999) Semicond. Sci. Technol. , vol.14 , pp. 489-495
    • Kumar, A.1    Kalra, E.2    Haldar, S.3    Gupta, R.S.4
  • 9
    • 0024124153 scopus 로고
    • 1/f noise in the linear region of LDD MOSFETs
    • Dec.
    • C. Y. H. Tsai and J. Gong, "1/f noise in the linear region of LDD MOSFETs," IEEE Trans. Electron Devices, vol. 35, pp. 2373-2377, Dec. 1988.
    • (1988) IEEE Trans. Electron Devices , vol.35 , pp. 2373-2377
    • Tsai, C.Y.H.1    Gong, J.2
  • 10
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    • An accurate mobility model for the I-V characteristics of n-channel enhancement-mode MOSFET's with single-channel Boron implantation
    • C. Y. Wu and Y. W. Daih, "An accurate mobility model for the I-V characteristics of n-channel enhancement-mode MOSFET's with single-channel Boron implantation," Solid State Electron., vol. 28, pp. 1271-1278, 1985.
    • (1985) Solid State Electron. , vol.28 , pp. 1271-1278
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  • 11
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    • K. K. Hung, P. K. Ko, C. Hu, and Y. C. Cheng, "A unified model for the flicker noise in metal-oxide-semiconductor field-effect transistors," IEEE Trans. Electron Devices, vol. 37, pp. 654-665, Mar. 1990.
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  • 12
    • 0028397615 scopus 로고
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    • F. Matsuoka et al., "Drain structure optimization for highly reliable deep submicrometer n-channel MOSFET," IEEE TransElectron Devices, vol. 41, pp. 420-426, Mar. 1994.
    • (1994) IEEE TransElectron Devices , vol.41 , pp. 420-426
    • Matsuoka, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.