40% efficient thin-film surface-textured light-emitting diodes by optimization of natural lithography

IEEE Transactions on Electron Devices

Volumn 47, Issue 7, 2000, Pages 1492-1498

  Windisch, Reiner ^b   Dutta, Barun ^a,b   Kuijk, Maarten ^c   Knobloch, Alexander ^d   Meinlschmidt, Stefan ^d   Schoberth, Stefan ^d   Kiesel, Peter ^d   Borghs, Gustaaf ^b   Döhler, Gottfried H ^d   Heremans, Paul ^a,b  

^a IEEE

^b IMEC   (Belgium)

^c VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^d UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; LITHOGRAPHY; MONOCHROMATORS; MONOLAYERS; OPTIMIZATION; POLYSTYRENES; QUANTUM EFFICIENCY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE PROPERTIES; THIN FILMS;

NONRESONANT CAVITY; SEMICONDUCTOR AIR INTERFACE;

LIGHT EMITTING DIODES;

EID: 0034227811     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.848298     Document Type: Article

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