Growth of ultrathin Co/Cu/Si(110) films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1278-1281

  Maat, S ^a   Liu, C ^a   Eads, W ^a   Umlor, M T ^a,b   Mankey, G J ^a  

^a University of Alabama   (United States)

^b UNIVERSITY OF WISCONSIN OSHKOSH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; COBALT; COPPER; CRYSTAL ORIENTATION; EVAPORATION; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR BEAM EPITAXY; SILICON; SPUTTER DEPOSITION; ULTRATHIN FILMS;

ULTRAHIGH VACUUM SPUTTER DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0034227741     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582340     Document Type: Article

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