Growth of boron doped (100) textured diamond films by three-step process

EPJ Applied Physics

Volumn 11, Issue 1, 2000, Pages 3-8

  Chen, Chau Shu ^a   Chen, Chi Ling ^a   Lue, Juh Tzeng ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; FILM GROWTH; HEAT TREATMENT; HYDROGENATION; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING BORON; SEMICONDUCTOR DOPING; SILICON WAFERS; TEXTURES;

FIELD EMISSION CURRENT DENSITY; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; NEGATIVE ELECTRON AFFINITY;

DIAMOND FILMS;

EID: 0034226206     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2000139     Document Type: Article

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