Structure analysis of SrTiO3/BaTiO3 strained superlattice films prepared by atomic-layer metalorganic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 A, 2000, Pages 4164-4167

  Wang, Zaiyang ^a   Oda, Shunri ^a   Karlsteen, M ^b   Sodervall U ^b   Willander, Magnus ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF GOTHENBURG   (Sweden)

Author keywords

BaTiO3; MOCVD; SIMS; SrTiO3; Superlattice; TEM; XRD

Indexed keywords

ATOMIC FORCE MICROSCOPY; BARIUM TITANATE; COMPOSITION; DIELECTRIC PROPERTIES; DISLOCATIONS (CRYSTALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR GROWTH; STRESS RELAXATION; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ATOMIC LAYER METALLORGANIC CHEMICAL VAPOR DEPOSITION; STRAINED SUPERLATTICE FILMS; STRONTIUM TITANATE;

SEMICONDUCTOR SUPERLATTICES;

EID: 0034216142     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.4164     Document Type: Article

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