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Volumn 37, Issue 3 A, 1998, Pages 942-947
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Atomic layer-by-layer metal-organic chemical vapor deposition of SrTiO3 films with a very smooth surface
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Author keywords
AFM; ALMOCVD; Co deposition MOCVD; FWHM; SrTiO3; Surface morphology; Thin film; XRD
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
FILM GROWTH;
FILM PREPARATION;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MORPHOLOGY;
STRONTIUM COMPOUNDS;
SURFACE PROPERTIES;
TITANIUM COMPOUNDS;
X RAY DIFFRACTION;
STRONTIUM TITANATE;
THIRD GENERATION DIPIVALOYLMETHANE CHELATE;
THIN FILMS;
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EID: 0032023316
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.37.942 Document Type: Article |
Times cited : (14)
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References (16)
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