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Volumn 37, Issue 3 A, 1998, Pages 942-947

Atomic layer-by-layer metal-organic chemical vapor deposition of SrTiO3 films with a very smooth surface

Author keywords

AFM; ALMOCVD; Co deposition MOCVD; FWHM; SrTiO3; Surface morphology; Thin film; XRD

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; STRONTIUM COMPOUNDS; SURFACE PROPERTIES; TITANIUM COMPOUNDS; X RAY DIFFRACTION;

EID: 0032023316     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.942     Document Type: Article
Times cited : (14)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.