Effect of surface oxidation on Raman spectroscopy of β-FeSi2

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 A, 2000, Pages 4051-4052

  Maeda, Yoshihito ^a,c   Miyake, Kiyoshi ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b SAITAMA UNIVERSITY   (Japan)

^c Osaka Prefecture University   (Japan)

Author keywords

Raman spectroscopy; Silicide; Surface oxidation; FeSi2

Indexed keywords

DEGRADATION; ETCHING; IRON COMPOUNDS; OXIDATION; PHOTOMULTIPLIERS; RAMAN SPECTROSCOPY; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

IRON DISILICIDE; RAMAN POLARIZABILITY TENSOR; SURFACE OXIDATION;

SEMICONDUCTOR MATERIALS;

EID: 0034215581     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.4051     Document Type: Article

References (10)

1. H. Lange: Phys. Status Solidi B 201 (1997) 3.
2. D. Leong, M. Harry, K. Reeson and K. P. Homewood: Nature 387 (1997) 686.
3. N. E. Christensen: Phys. Rev. B 42 (1990) 7148.
4. L. Miglio and G. Malegori: Phys. Rev. B 52 (1995) 1448.
5. K. Lefki, P. Muret, E. Bustrarek, R. Madar, J. Chevrier, J. Derrien and M. Brunel: Solid State Commun. 80 (1991) 791.
6. G. Guizzetti, F. Marabelli, M. Patrini, P. Pellegrino, B. Pivac, L. Miglio, V. Meregalli, H. Lange. W. Henrion and V. Tomm: Phys. Rev. B 55 (1997) 14290.
7. Y. Maeda, K. Umezawa and K. Miyake: Mater. Res. Soc. Symp. Proc. 486 (1998) 329.
8. Y. Maeda, K. Umezawa, K. Miyake and K. Ohashi: to be published in Thin Solid Films.
9. W. Hernrion, St. Brehme, I. Sieber, H. von Kaenel. Y. Tomm and H. Lange: Solid State Phenom. 51/52 (1996) 341.
10. P. Y. Yu and M. Cardona: Fundamentals of Semiconductors (Springer-Verlag, Berlin, 1996) Chap. 7.