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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 A, 2000, Pages 4153-4157

Dielectric properties and strain analysis in paraelectric ZrTiO4 thin films deposited by DC magnetron sputtering

(4) Kim, Taeseok a Oh, Jeongmin a Park, Byungwoo a Hong, Kug Sun a

a Seoul National University (South Korea)

Author keywords

Dielectric loss; Magnetron sputtering; Paraelectric; Strain analysis; ZrTiO4 thin films

Indexed keywords

ANNEALING; DIELECTRIC LOSSES; DIELECTRIC PROPERTIES OF SOLIDS; ELECTRIC VARIABLES MEASUREMENT; MAGNETRON SPUTTERING; PERMITTIVITY; SPUTTER DEPOSITION; STRAIN; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

DEPOSITION TEMPERATURE; PARAELECTRIC PROPERTIES; STRAIN ANALYSIS; ZIRCONIUM TITANATE;

THIN FILMS;

EID: 0034215469 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.4153 Document Type: Article

Times cited : (13)

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