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Volumn 81, Issue 2, 1998, Pages 439-445

Highly oriented (Zr0.7Sn0.3)TiO4 thin films grown by rf magnetron sputtering

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; FILM GROWTH; FILM PREPARATION; MAGNETRON SPUTTERING; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; SILICON; THIN FILMS; X RAY CRYSTALLOGRAPHY;

EID: 0032003756     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1998.tb02356.x     Document Type: Article
Times cited : (28)

References (13)
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    • (1990) Br. Ceram. Trans. J. , vol.89 , Issue.2 , pp. 39-43
    • Wakino, K.1    Nishikawa, T.2    Ishikawa, Y.3    Tamura, H.4
  • 6
    • 0023960659 scopus 로고
    • Phase Transformation and Thermal Expansion of Zirconium and Hafnium Titanates and Their Solid Solution
    • H. Ikawa, A. Iwai, K. Hiruta, H. Shimojima, K. Urabe, and S. Udagawa, "Phase Transformation and Thermal Expansion of Zirconium and Hafnium Titanates and Their Solid Solution," J. Am. Ceram. Soc., 71 [2] 120-27 (1988).
    • (1988) J. Am. Ceram. Soc. , vol.71 , Issue.2 , pp. 120-127
    • Ikawa, H.1    Iwai, A.2    Hiruta, K.3    Shimojima, H.4    Urabe, K.5    Udagawa, S.6
  • 7
    • 0003754811 scopus 로고
    • 4 Thin Films by Radio-Frequency Magnetron Sputtering
    • 4 Thin Films by Radio-Frequency Magnetron Sputtering," Appl. Phys. Lett., 64 [24] 3252-54 (1994).
    • (1994) Appl. Phys. Lett. , vol.64 , Issue.24 , pp. 3252-3254
    • Chang, D.A.1    Lin, P.2    Tseng, T.Y.3
  • 8
    • 36449009802 scopus 로고
    • 4 Films Sputtered on Silicon at Low Temperature
    • 4 Films Sputtered on Silicon at Low Temperature," J. Appl. Phys., 78 [12] 7103-108 (1995).
    • (1995) J. Appl. Phys. , vol.78 , Issue.12 , pp. 7103-7108
    • Chang, D.A.1    Lin, P.2    Tseng, T.Y.3
  • 9
    • 0029370431 scopus 로고
    • Effects of Substrate Temperature and Oxygen Partial Pressure on the Properties of Sputtered Zirconium Titanate Thin Films
    • D. A. Chang, P. Lin, and T. Y. Tseng, "Effects of Substrate Temperature and Oxygen Partial Pressure on the Properties of Sputtered Zirconium Titanate Thin Films," Jpn. J. Appl. Phys., Part 1, 34, 4854 (1995).
    • (1995) Jpn. J. Appl. Phys., Part 1 , vol.34 , pp. 4854
    • Chang, D.A.1    Lin, P.2    Tseng, T.Y.3
  • 10
    • 0003495856 scopus 로고    scopus 로고
    • Card Nos. 34-31 to 34-33. International Centre for Diffraction Data, Newtown Square, PA
    • Powder Diffraction File, Card Nos. 34-31 to 34-33. International Centre for Diffraction Data, Newtown Square, PA.
    • Powder Diffraction File
  • 12
    • 84985155761 scopus 로고
    • X-ray Photoelectron Spectroscopy Study of High- and Low-Temperature Forms of Zirconium Titanate
    • H. Ikawa, T. Yamada, K. Kojima, and S. Matsumoto, "X-ray Photoelectron Spectroscopy Study of High- and Low-Temperature Forms of Zirconium Titanate," J. Am. Ceram. Soc., 74 [6] 1459-62 (1991).
    • (1991) J. Am. Ceram. Soc. , vol.74 , Issue.6 , pp. 1459-1462
    • Ikawa, H.1    Yamada, T.2    Kojima, K.3    Matsumoto, S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.