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Volumn 81, Issue 2, 1998, Pages 439-445
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Highly oriented (Zr0.7Sn0.3)TiO4 thin films grown by rf magnetron sputtering
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
COMPOSITION EFFECTS;
CRYSTAL ORIENTATION;
FILM GROWTH;
FILM PREPARATION;
MAGNETRON SPUTTERING;
PERMITTIVITY;
POLYCRYSTALLINE MATERIALS;
SECONDARY ION MASS SPECTROMETRY;
SILICON;
THIN FILMS;
X RAY CRYSTALLOGRAPHY;
ZIRCONIUM TIN TITANIUM OXIDE;
ZIRCONIUM COMPOUNDS;
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EID: 0032003756
PISSN: 00027820
EISSN: None
Source Type: Journal
DOI: 10.1111/j.1151-2916.1998.tb02356.x Document Type: Article |
Times cited : (28)
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References (13)
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