Experimental evaluation of arrayed microcolumn lithography

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 271-277

  Muray, L P ^a   Lee, K Y ^a   Spallas, J P ^a   Mankos, M ^a   Hsu, Y ^a   Gmur, M R ^a   Gross, H S ^a   Stebler, C B ^a   Chang, T H P ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; MASKS; MICROELECTRONIC PROCESSING; POLYMETHYL METHACRYLATES; SUBSTRATES;

MICROCOLUMN LITHOGRAPHY; PATTERN GENERATOR;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034206896     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00313-0     Document Type: Article

References (10)

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10. rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Marco Island, FL, June 1999.