Development of new apparatus for field emission measurement

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 6 A, 2000, Pages 3596-3598

  Lee, Kuei Yi ^a   Ryu, Jeong Tak ^b   Arimatsu, Daiki ^a   Kohara, Hidekazu ^a   Katayama, Mitsuhiro ^a   Wang, Xiao Guang ^a   Hirao, Takashi ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Daegu University   (South Korea)

Author keywords

Amorphous carbon; Current density distribution; Field emission profiler

Indexed keywords

AMORPHOUS FILMS; CARBON; CURRENT DENSITY; DISPLAY DEVICES; ELECTRIC CURRENT DISTRIBUTION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION;

FIELD EMISSION DISPLAYS;

FIELD EMISSION CATHODES;

EID: 0034206476     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3596     Document Type: Article

References (11)

1. J. E. Jaskie: MRS Bull. 21 (1996) 59.
2. W. Zhu, G. P. Kochanski, S. Jin, L. Seibles, D. C. Jacobson, M. McCormack and A. E. White: Appl. Phys. Lett. 67 (1995) 1157.
3. Y. W. Ko and S. I. Kim: J. Appl. Phys. 82 (1997) 2631.
4. P. G. Collins and A. Zettl: Appl. Phys. Lett. 69 (1996) 1969.
5. B. L. Weiss, A. Badzian, L. Pilione, T. Badzian and W. Drawl: Appl. Phys. Lett. 71 (1997) 794.
6. J. Robertson and W. Milne: J. Non-Cryst. Solids 227 (1998) 558.
7. K. Okano, T. Yamada, A. Sawabe, S. Koizumi, R. Matsuda, C. Bandis, W. Chang and B. B. Pate: Appl. Surf. Sci. 146 (1999) 274.
8. U. Hoffmann, A, Weber, T. Löhken, C.-P. Klages, C. Spaeth and F. Richter: Diamond Relat. Mater. 7 (1998) 682.
9. D. A. I. Munindradasa, M. Chhowalla, G. A. J. Amaratunga and S. R. P. Silva: J. Non-Cryst. Solids 227 (1998) 1106.
10. M. Watamori, M. Isono, K. Chihara, S. Honda and K. Oura: Proc. 4th Int. Symp. Sputtering and Plasma Process (ISSP'97) (1997) p. 197.
11. I. Kleps, D. Nicolaescu, I. Stamatin, A. Correia, A. Gil and A. Zlatkin: Appl. Surf. Sci. 146 (1999) 152.