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Volumn 448, Issue 1, 2000, Pages 294-298

Structure study of thin boron and silicon carbonitride films by diffraction of synchrotron radiation

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; BORON COMPOUNDS; CRYSTAL STRUCTURE; PHASE COMPOSITION; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON COMPOUNDS; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

EID: 0034206196     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(00)00230-8     Document Type: Article
Times cited : (10)

References (9)
  • 7
    • 85031565259 scopus 로고
    • JCPDS International Center for Diffraction Data, USA, V. 25, card N 1033
    • JCPDS International Center for Diffraction Data, 1988, USA, V. 25, card N 1033.
    • (1988)
  • 9
    • 85031578245 scopus 로고
    • JCPDS Int. Center for Diffraction Data, USA, V. 9, card N 250
    • JCPDS Int. Center for Diffraction Data, 1988, USA, V. 9, card N 250.
    • (1988)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.