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Volumn 448, Issue 1, 2000, Pages 294-298
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Structure study of thin boron and silicon carbonitride films by diffraction of synchrotron radiation
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
BORON COMPOUNDS;
CRYSTAL STRUCTURE;
PHASE COMPOSITION;
PHASE TRANSITIONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING SILICON COMPOUNDS;
SYNCHROTRON RADIATION;
X RAY DIFFRACTION ANALYSIS;
BORON CARBONITRIDE;
REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON CARBONITRIDE;
SYNCHROTRON RADIATION DIFFRACTION;
THIN FILMS;
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EID: 0034206196
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-9002(00)00230-8 Document Type: Article |
Times cited : (10)
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References (9)
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