Investigation of removal rate properties of a floating polishing process

Journal of the Electrochemical Society

Volumn 147, Issue 6, 2000, Pages 2290-2296

  Su, Yaw Terng ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; LUBRICATION; MACHINING; PARTICLES (PARTICULATE MATTER); REMOVAL; SHEAR STRESS; SLURRIES; SURFACE PROPERTIES; VISCOSITY;

FLOATING POLISHING PROCESS; REMOVAL RATE PROPERTIES;

ELECTROLYTIC POLISHING;

EID: 0034206016     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393523     Document Type: Article

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