Study on initial oxidation of Si(100)-2×1 surfaces by coaxial impact collision ion scattering spectroscopy

Applied Surface Science

Volumn 159, Issue , 2000, Pages 35-40

  Wasekura, M ^a   Higashi, M ^a   Ikeda, H ^a   Sakai, A ^a   Zaima, S ^a   Yasuda, Y ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL ORIENTATION; GAS ADSORPTION; ION BOMBARDMENT; MONOLAYERS; OXIDATION; SEMICONDUCTING FILMS; SPECTROSCOPIC ANALYSIS;

COAXIAL IMPACT COLLISION ION SCATTERING SPECTROSCOPY (CAICISS);

SEMICONDUCTING SILICON;

EID: 0034204967     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00099-4     Document Type: Article

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