Modeling anomalous depth dependent dissolution effects in chemically amplified resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1294-1298

  Cheng, Mosong ^b   Tyminski, Jacek ^a,b   Croffie, Ebo ^b   Neureuther, Andrew ^b  

^a NIKON PRECISION INC   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; DISSOLUTION; EVAPORATION; MATHEMATICAL MODELS;

CHEMICALLY AMPLIFIED RESISTS;

CONDUCTIVE PLASTICS;

EID: 0034188066     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591377     Document Type: Article

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