Study on nanosized TiO/WO3 thin films achieved by radio frequency sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 509-514

  Guidi, V ^a   Comini, E ^b   Ferroni, M ^a   Martinelli, G ^a   Sberveglieri, G ^b  

^a UNIVERSITY OF FERRARA   (Italy)

^b UNIVERSITY OF BRESCIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL SENSORS; FILM GROWTH; MAGNETRON SPUTTERING; MICROSCOPIC EXAMINATION; NANOSTRUCTURED MATERIALS; NITROGEN OXIDES; SEMICONDUCTOR DOPING; TEMPERATURE; TITANIUM OXIDES; TUNGSTEN COMPOUNDS;

RADIO FREQUENCY SPUTTERING; TUNGSTEN TRIOXIDE;

THIN FILMS;

EID: 0034156373     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582217     Document Type: Article

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