Self-assembled monolayers prepared from ω-thiophene-functionalized n- alkyltrichlorosilane on silicon substrates

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 161, Issue 1, 2000, Pages 203-212

  Appelhans, D ^a,b   Ferse, D ^a   Adler, H J P ^a   Plieth, W ^a   Fikus, A ^a   Grundke, K ^b   Schmitt, F J ^b   Bayer, T ^b   Adolphi, B ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

Author keywords

Adsorption; n Alkyltrichlorosilanes; Self assembled monolayers; Silicon substrates; Thiophene based surface

Indexed keywords

ADSORPTION; ANGLE MEASUREMENT; CHLORINE CONTAINING POLYMERS; CONTACT ANGLE; FILM PREPARATION; PLASTIC FILMS; POLYMERIZATION; POLYSILANES; SILICON WAFERS; SILICONES; SULFUR COMPOUNDS; SURFACE ROUGHNESS;

SELF-ASSEMBLED MONOLAYERS;

MONOLAYERS;

SILANE DERIVATIVE; SILICON; THIOPHENE DERIVATIVE;

ADSORPTION; ARTICLE; CHEMICAL ANALYSIS; CONTACT ANGLE; DRY DEPOSITION; POLYMERIZATION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0033990636     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(99)00338-6     Document Type: Article

References (50)

1. Sagiv J. J. Am. Chem. Soc. 102:1980;92.
2. Ulman A. Chem. Rev. 96:1996;1533.
3. Bain C.D., Trougthon E.B., Tao Y.-T., Evall J., Whitesides G.M., Nuzzo R.G. J. Am. Chem. Soc. 111:1989;321.
4. Porter M.D., Bright T.B., Allara D.L., Chidsey C.E.D. J. Am. Chem. Soc. 109:1987;3559.
5. Jennings G.K., Laibnis P.E. Langmuir. 12:1996;6173.
6. Stewart K.R., Whitesides G.M., Godfried H.P. Surf. Sci. 57:1988;1381.
7. Netzer L., Iscovici R., Sagiv J. Thin Solid Films. 100:1983;67.
8. Brzoska J.B., Azouz I.B., Rondelez F. Langmuir. 10:1994;4367.
9. Banga R., Yarwood J., Morgan A.M., Evans B., Kells J. Langmuir. 11:1995;4367.
10. Calistri-Yeh M., Kramer E.J., Sharma R., Zhao W., Raflailovich M.H., Sokolov J. et al. Langmuir. 11:1995;4367.
11. Tripp C.P., Hair M.L. Langmuir. 8:1992;1120.
12. Wassermann S.R., Tao Y.-T., Whitesides G.M. Langmuir. 5:1989;1074.
13. Tillman N., Ulman A., Schildkraut J.S., Penner T.L. J. Am. Chem. Soc. 111:1988;6136.
14. Parikh A.N., Allara D.L. J. Phys. Chem. 98:1994;7577.
15. Bierbaum K., Kinzler M., Wöll Ch., Grunze M., Hähner G., Heid S. et al. Langmuir. 11:1995;512.
16. Bierbaum K., Grunze M., Baski A.A., Chi L.F., Schrepp W., Fuchs H. Langmuir. 11:1995;2143.
17. Heise A., Menzel H., Yim H., Foster M.D., Wieringa R.H., Schouten A.J. et al. Langmuir. 13:1997;723.
18. Balachander N., Sukenik C.N. Langmuir. 7:1991;1621.
19. Margel S., Sivan O., Dolitzky Y. Langmuir. 7:1991;2317.
20. Jin Z.H., Vezenov D.V., Lee Y.W., Zull J.E., Sukenik C.N., Savinell R.F. Langmuir. 13:1994;2662.
21. Linford M.R., Fenter P., Eisenberger P.M., Chidsey C.E.D. J. Am. Chem. Soc. 117:1995;3145.
22. Tillman N., Ulman A., Penner T.L. Langmuir. 5:1989;101.
23. J. Sagiv, in: A. Ulman (Ed.), Organic Thin Films and Surfaces: Direction in the Nineties, vol. 20, Academic Press, New York 1995, p. 64.
24. Mino N., Ogawa K., Hatada M., Takatsuka M., Sha S., Moriizumi T. Langmuir. 9:1993;1280.
25. Prucker O., Rühe J. Macromolecules. 31:1998;592.
26. Jordan R., Ulman A. J. Am. Chem. Soc. 120:1998;243.
27. Jiang M., Nölting B., Stayton P.S., Sligar S.G. Langmuir. 12:1996;1278.
28. Liebmann-Vinson A., Lander L.M., Foster M.D., Brittain W.J., Vogler E.A., Maikrzak C.F. et al. Langmuir. 12:1996;2256.
29. M.V. Merritt, M. Mrksich, G.M. Whitesides, Princ. Tissue Eng. (1997) 211.
30. Nakamura T., Kondoh H., Matsumoto M., Nozoye H. Langmuir. 12:1996;5977.
31. Michalitsch R., Lang P., Yassar A., Nauer G., Garnier F. Adv. Mater. 9:1997;321.
32. Schmelzer M., Burghard M., Fischer C.M., Bäuerle P., Schier H., Roth S. et al. Synth. Metals. 67:1994;281.
33. N. Mino, K. Ogawa, T. Ishihara, M. Endo, T. Kuboto, K. Asakura, Eur. Pat. Appl. EP 0 587 159 A1 (1994).
34. W. Plieth, A. Fikus, D. Appelhans, H.-J. Adler, German Patent Application No. 2661977 (1998).
35. D. Appelhans, D. Ferse, H.-J. Adler, A. Fikus, W. Plieth, B. Aldolphi et al., J. Electrochem Soc. (accepted).
36. K.A. Murray, S.C. Moratti, D.R. Baigent, N.C. Greenham, K. Pichler, A.B. Holmes et al., Synthetic Metals 69 (1995) 395; mention of 3-(10-undecenyl)thiophene without synthetic details and without analytical data.
37. Tamao K., Sumitani K., Kiso Y., Zembayashi M., Fujioka A., Kodama S. et al. Bull. Chem. Soc. Jpn. 49:1976;1958.
38. Tamao K., Kodama S., Nakajima J., Kumada M. Tetrahedron. 38:1982;3347.
39. Speier J.L. Review of hydrosilylation reactions. Adv. Organomet. Chem. 17:1979;407.
40. Rotenberg Y.R., Boruvka L., Neumann A.W. J. Colloid Interface Sci. 93:1983;169.
41. Kwok D.Y., Gietzelt T., Grundke K., Jacobasch H.-J., Neumann A.W. Langmuir. 13:1997;2880.
42. Augsburg A., Grundke K., Pöschel K., Jacobasch H.-J., Neumann A.W. Acta Polym. 49:1998;417.
43. Kwok D.Y., Lin R., Mui M., Neumann A.W. Colloids Surf. A. 116:1996;63.
44. Rabinovich Ya I., Yoon R.-H. Langmuir. 10:1994;1903.
45. Rye R.R., Nelson G.C., Dugger M.T. Langmuir. 13:1997;2965.
46. Marmur A. J. Colloid Interface Sci. 168:1994;40.
47. Decker E.L., Garoff S. Langmuir. 12:1996;2100.
48. Banga R., Yarwood A.M.M., Evans B., Kells J. Langmuir. 11:1995;4393.
49. Calistri-Yeh M., Kramer E.J., Sharma R., Zhao W., Rafailovich M.H., Sokolov J. et al. Langmuir. 12:1996;2747.
50. Characterization of atoms and calculations of XPS atomic percentages, in: J.F. Moulder, W.F. Stickle, P.E. Sobal, K.D Bomben (Eds.), Handbook of X-ray Photoelectron Spectroscopy; Physical Electronics Inc., 1995; ISBN: 0-9648124-1-X.