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Volumn 209, Issue 4, 2000, Pages 795-800
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Study on the solid state reaction between crystalline Co film and Si(1 1 1) substrate
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Author keywords
[No Author keywords available]
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Indexed keywords
COBALT COMPOUNDS;
CRYSTAL ORIENTATION;
CRYSTALLINE MATERIALS;
EPITAXIAL GROWTH;
FILM GROWTH;
RAPID THERMAL ANNEALING;
SILICON;
SINGLE CRYSTALS;
SUBSTRATES;
THERMAL EFFECTS;
PREFERENTIAL ORIENTATION;
METALLIC FILMS;
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EID: 0033908069
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(99)00589-8 Document Type: Article |
Times cited : (10)
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References (14)
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