`Real-time' multiwavelength ellipsometry diagnostics for monitoring dry etching of Si and TiNx deposition

Thin Solid Films

Volumn 364, Issue 1, 2000, Pages 213-219

  Kechagias, V G ^a   Gioti, M ^a   Logothetidis, S ^a   Benferhat, R ^b   Teer, D ^c  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b Jobin Yvon   (France)

^c TEER COATINGS LTD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; FILM GROWTH; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; STOICHIOMETRY; TITANIUM NITRIDE;

ULTRA-FAST MULTIWAVELENGTH ELLIPSOMETRY (UMWE);

ELLIPSOMETRY;

EID: 0033907713     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00933-5     Document Type: Article

References (15)

1. Zahorski D., Mariani J.L., Scadafals L., Gilles J. Thin Solid Films. 234:1993;412.
2. Nguyen H.V., Collins R.W. Thin Solid Films. 233:1993;272.
3. Irene E.A. Thin Solid Films. 233:1993;96.
4. Mogab C.J. Sze S.M. VLSI Technology. 1983;457 McGraw-Hill, New York.
5. Musil J., Rajsky A., Bell A.J., Malouš J., Čepera M., Zeman J. J. Vac. Sci. Technol. A. 14:(4):1996;2187.
6. Rohne S.L., Sproul W.D. J. Vac. Sci. Technol. A. 9:(3):1991;1178.
7. Maynard H.L., Layadi N., Lee J.T.C. Thin Solid Films. 313-. 314:1998;398.
8. Azzam R.M., Bashara N.M. Ellipsometry of Polarized Light. 1977;North-Holland, Amsterdam.
9. Logothetidis S., Alexandrou I., Papadopoulos A. J. Appl. Phys. 77:(3):1995;1.
10. Thornton J.A., Greene J.E. Bunshah R.F. Handbook of Deposition Technologies for Films and Coatings. 1994;302 Noyes Publications, Park Ridge, NJ.
11. Bruggeman D.A.G. Ann. Phys. (Leipzig). 24:1935;636.
12. Logothetidis S., Alexandrou I., Kokkou S. Surf. Coat. Technol. 80:1996;66.
13. Logothetidis S., Meletis E.I., Kourouklis G. J. Mater. Res. 14:1999;436.
14. Asinovsky L., Frisa L.E. Thin Solid Films. 313-. 314:1998;303.
15. P. Patsalas, C. Charitidis, S. Logothetidis, Appl. Surf. Sci. (1999) submitted for publication.