Simulation of thin film growth visualization in photodeposition

Applied Surface Science

Volumn 154, Issue , 2000, Pages 324-330

  Peled, A ^a   Mirchin, N ^a   Zacharia, Z ^a   Peled, C R ^b  

^a HOLON INSTITUTE OF TECHNOLOGY   (Israel)

^b HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; COMPUTER SIMULATION; DEPOSITION; DIFFERENTIAL EQUATIONS; DIFFUSION IN SOLIDS; FILM GROWTH; FREQUENCY DOMAIN ANALYSIS; MICROSTRUCTURE; PROBABILITY DENSITY FUNCTION; SELENIUM; THIN FILMS;

PHOTODEPOSITION;

AMORPHOUS FILMS;

EID: 0033906178     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00449-3     Document Type: Article

References (17)

1. Barabasi A.L., Stanley H.E. Fractal Concepts in Surface Growth. 1995;Cambridge Univ. Press, Cambridge.
2. Peled A. Transformation steps of microstructures in photodeposited films of a-Se. J. Mater. Res. 4(1):1989;177-179.
3. Porath D., Milo O. Scanning tunneling microscopy studies and computer simulations of annealing of gold films. J. Vac. Sci. Technol., B. 14(1):1996;30-37.
4. Frost H.J., Thompson C.V. Computer simulation of microstructure evolution in thin films. J. Electron. Mater. 17:1988;447.
5. Carel R., Thompson C.V., Frost H.J. Computer simulation of strain energy effects vs. surface and interface energy effects on grain growth in thin films. Acta Metall. Mater. 44:1996;2479.
6. Thompson C.V. Texture evolution during grain growth in polycrystalline films. Scr. Metall. Mater. 28:1993;167.
7. Carel R., Thompson C.V. Stress and grain growth in thin films. J. Mech. Phys. Solids. 44:1996;657.
8. Rapaport D.C. The Art of Molecular Dynamics. 1995;Cambridge Univ. Press, Cambridge.
9. Ferguson D. Monte Carlo Methods in Chemical Physics. 1998;Wiley, New York.
10. Haile J.M. Molecular Dynamics Simulation. 1992;Wiley, New York.
11. Marchuk G.I. Splitting and alternating direction methods. Ciarlet P.G., Lions J.L. Handbook of Numerical Analysis. 1990;197-375 North-Holland, Amsterdam.
12. Peled A. Review: state of the art in liquid phase photodeposition processes and applications (LPPD). Lasers Eng. 6:1997;41-79.
13. Alam M.A., People R., Isaacs E., Kim C.Y., Evans-Lutterodt K., Siegrist T., Pernell T.L., Vanderberg J., Spritz S.K., Chu S.N.G., Lang D.V., Smith L., Hybertsen M.S. Simulations and characterization of the selective area growth process. Appl. Phys. Lett. 74(18):1999;2617-2619.
14. Xia H., Zinks-Allmang M. Rate equation approach to the late stages of cluster ripening. Physica A. 261:1998;176-187.
15. Russ J.C. Image Processing Handbook. 1995;33 CRC Press, Boca Raton, FL.
16. Klette R., Zamperoni P. Handbook of Image Processing Operators. 1996;192 Wiley, Chichester.
17. Peled A., Baranauskas V., Rodrigues C., Art-Weisman D., Grantman L., Friesem A.A. Characterization of photodeposited selenium planar structures by scanning force microscopy. J. Appl. Phys. 77(12):1995;6208-6213.