Nucleation and growth dynamics of diamond films by microwave plasma-enhanced chemical vapor deposition (MPECVD)

Surface and Coatings Technology

Volumn 123, Issue 2-3, 2000, Pages 129-133

  Ye, Haitao ^a,b   Sun, Chang Q ^a   Hing, Peter ^b   Xie, Hong ^a   Zhang, Sam ^a   Wei, Jun ^a  

^a SCHOOL OF APPLIED SCIENCE   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

CVD; Diamond; Dynamics; Nucleation; Plasma

Indexed keywords

CRYSTAL GROWTH; DIAMOND FILMS; MORPHOLOGY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; X RAY CRYSTALLOGRAPHY;

DIAMOND COATINGS; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (MPECVD);

COATINGS;

EID: 0033904830     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00527-7     Document Type: Article

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