Optimising control of microwave plasma bias enhanced nucleation for heteroepitaxial chemical vapour deposition diamond

Diamond and Related Materials

Volumn 6, Issue 5-7, 1997, Pages 676-680

  Marshall, R Duncan ^a   Whitfield, Michael D ^a   Tracey, Sam ^b   Thompson, Daniel J ^b   Foord, John S ^b   Jackman, Richard B ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Bias enhanced nucleation; Diamond nucleation; Heteroepitaxy; Optical reflectivity

Indexed keywords

EID: 0003922241     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00751-0     Document Type: Article

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