Depth resolution in sputter depth profilling-characterization of a third batch of tantalum pentoxide on tantalum certified reference meterial by AES and SIMS

Surface and Interface Analysis

Volumn 29, Issue 1, 2000, Pages 73-81

  Seah, M P ^a   Spencer, S J ^a   Gilmore, I S ^a   Johnstone, J E ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

Decay lengths; Depth resolution; Reference material; Sputter depth profiling; Tantalum pentoxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ION BEAMS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CERTIFIED REFERENCE MATERIALS (CRM); DEPTH PROFILING; TANTALUM PENTOXIDE;

TANTALUM COMPOUNDS;

EID: 0033903511     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1096-9918(200001)29:1<73::aid-sia695>3.0.co;2-3     Document Type: Article

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