-
1
-
-
0004286686
-
-
Chap. 6, Krieger Publishing, Boston
-
B. J. Baliga, Modern Power Devices, Chap. 6, Krieger Publishing, Boston (1992).
-
(1992)
Modern Power Devices
-
-
Baliga, B.J.1
-
3
-
-
0042303256
-
-
W. Bardsley, J. M. Callan, H. A. Chedzey, and D. T. J. Hurle, Solid-State Electron., 3, 142 (1961).
-
(1961)
Solid-state Electron.
, vol.3
, pp. 142
-
-
Bardsley, W.1
Callan, J.M.2
Chedzey, H.A.3
Hurle, D.T.J.4
-
5
-
-
33846950724
-
-
J. Grabmaier Editor, Spring-Verlag, Berlin
-
W. Zulehner and D. Huber, in Crystals Growth 8: Silicon Chemical Etching, J. Grabmaier Editor, p. 28, Spring-Verlag, Berlin (1982).
-
(1982)
Crystals Growth 8: Silicon Chemical Etching
, pp. 28
-
-
Zulehner, W.1
Huber, D.2
-
6
-
-
0031207244
-
-
H.-D. Chiou, T.-Y. T. Lee, and S. Teng, J. Electrochem. Soc., 144, 2881 (1997).
-
(1997)
J. Electrochem. Soc.
, vol.144
, pp. 2881
-
-
Chiou, H.-D.1
Lee, T.-Y.T.2
Teng, S.3
-
7
-
-
84882929757
-
-
T. Abe, W. M. Bullis, S. Kobayashi, W. Lin, and P. Wagner, Editors, The Electrochemical Society Proceedings Series, Pennington, NJ
-
H.-D. Chiou and R. T. Pajela, in Defects in Silicon III, T. Abe, W. M. Bullis, S. Kobayashi, W. Lin, and P. Wagner, Editors, PV 99-1, p. 109, The Electrochemical Society Proceedings Series, Pennington, NJ (1999).
-
(1999)
Defects in Silicon III
, Issue.PV 99-1
, pp. 109
-
-
Chiou, H.-D.1
Pajela, R.T.2
-
8
-
-
84975412148
-
-
ASTM STP 850, D. C. Gupta, Editor, ASTM, Philadelphia
-
K. H. Yang, in Semiconductor Processing, ASTM STP 850, D. C. Gupta, Editor, p. 309, ASTM, Philadelphia (1984).
-
(1984)
Semiconductor Processing
, pp. 309
-
-
Yang, K.H.1
-
10
-
-
0026630810
-
-
H. Yamagishi, I. Fusegawa, N. Fujimaki, and M. Katayama, Semicond. Sci. Technol., 7, A135 (1992).
-
(1992)
Semicond. Sci. Technol.
, vol.7
-
-
Yamagishi, H.1
Fusegawa, I.2
Fujimaki, N.3
Katayama, M.4
-
13
-
-
0343910038
-
-
R. S. Hockett, P. B. Fraundorf, D. A. Reed, D. H. Wayne, and G. K. Fraundorf, in MRS Symp. Proc., 39, 433 (1986).
-
(1986)
MRS Symp. Proc.
, vol.39
, pp. 433
-
-
Hockett, R.S.1
Fraundorf, P.B.2
Reed, D.A.3
Wayne, D.H.4
Fraundorf, G.K.5
-
14
-
-
0022239334
-
-
N. G. Einspruch and H. Huff, Editors, Academic Press, New York
-
T. Abe, in VLSI Electronics: Microstructure Science, Vol. 12, N. G. Einspruch and H. Huff, Editors, p. 3, Academic Press, New York (1985).
-
(1985)
VLSI Electronics: Microstructure Science
, vol.12
, pp. 3
-
-
Abe, T.1
-
15
-
-
0342604325
-
-
ASTM STP 804, D. Gupta, Editor, ASTM, Philadelphia
-
W. Lin and D. W. Hill, in Silicon Processing, ASTM STP 804, D. Gupta, Editor, p. 24, ASTM, Philadelphia (1983).
-
(1983)
Silicon Processing
, pp. 24
-
-
Lin, W.1
Hill, D.W.2
-
16
-
-
0002962382
-
-
H. Föll, U. Gösele, and B. D. Kolbesen, J. Cryts. Growth, 40, 90 (1977).
-
(1977)
J. Cryts. Growth
, vol.40
, pp. 90
-
-
Föll, H.1
Gösele, U.2
Kolbesen, B.D.3
-
17
-
-
1842780059
-
-
Nanyang Technical University, Singapore
-
H.-D. Chiou and A. R. Yahya, in Proceedings of 7th International Symposium on IC Technology, Systems, and Applications (ISIC-97), p. 250, Nanyang Technical University, Singapore (1997).
-
(1997)
Proceedings of 7th International Symposium on IC Technology, Systems, and Applications (ISIC-97)
, pp. 250
-
-
Chiou, H.-D.1
Yahya, A.R.2
-
22
-
-
0342604317
-
-
J. R. Carruthers, R. B. Hoffman, and J. D. Ashner, J. Appl. Phys., 34, 3389 (1963).
-
(1963)
J. Appl. Phys.
, vol.34
, pp. 3389
-
-
Carruthers, J.R.1
Hoffman, R.B.2
Ashner, J.D.3
-
23
-
-
0016060451
-
-
G. Celotti, D. Nobili, and P. Ostoja, J. Mater. Sci., 9, 821 (1974).
-
(1974)
J. Mater. Sci.
, vol.9
, pp. 821
-
-
Celotti, G.1
Nobili, D.2
Ostoja, P.3
-
26
-
-
0343474276
-
-
R. A. McDonald, G. G. Ehlenberger, and T. R. Huffman, Solid-State Electron., 9, 807 (1966).
-
(1966)
Solid-state Electron.
, vol.9
, pp. 807
-
-
McDonald, R.A.1
Ehlenberger, G.G.2
Huffman, T.R.3
-
30
-
-
0027662307
-
-
S. Sadamitzu, S. Umeno, Y. Koike, M. Hourai, S. Sumita, and T. Shigematsu, Jpn. J. appl. Phys., 32, 3675 (1993).
-
(1993)
Jpn. J. Appl. Phys.
, vol.32
, pp. 3675
-
-
Sadamitzu, S.1
Umeno, S.2
Koike, Y.3
Hourai, M.4
Sumita, S.5
Shigematsu, T.6
-
31
-
-
0029324774
-
-
W. von Ammon, E. Dornberger, H. Oelkrug, and H. Weidner, J. Cryst. Growth, 151, 273 (1995).
-
(1995)
J. Cryst. Growth
, vol.151
, pp. 273
-
-
Von Ammon, W.1
Dornberger, E.2
Oelkrug, H.3
Weidner, H.4
-
32
-
-
0001184964
-
-
H. R. Huff, U. Gösele, and H. Tsuya, Editors, The Electrochemical Society Proceedings Series, Pennington, NJ
-
M. Hourai, H. Nishikawa, T. Tanaka, S. Umeno, E. Asayama, T. Nomachi, and G. Kelly, in Semiconductor Silicon 1998, H. R. Huff, U. Gösele, and H. Tsuya, Editors, PV 98-1, p. 453, The Electrochemical Society Proceedings Series, Pennington, NJ (1998).
-
(1998)
Semiconductor Silicon 1998
, Issue.PV 98-1
, pp. 453
-
-
Hourai, M.1
Nishikawa, H.2
Tanaka, T.3
Umeno, S.4
Asayama, E.5
Nomachi, T.6
Kelly, G.7
-
33
-
-
0000289478
-
-
H. R. Huff, U. Gösele, and H. Tsuya, Editors, The Electrochemical Society Proceedings Series, Pennington. NJ
-
R. Falster, V. V. Voronkov, J. C. Holser, S. Markgraf, S. Mcquaid, and L. Mule'Stagno, Semiconductor Silicon 1998. H. R. Huff, U. Gösele, and H. Tsuya, Editors, PV 98-1, p. 468. The Electrochemical Society Proceedings Series, Pennington. NJ (1998).
-
(1998)
Semiconductor Silicon 1998.
, Issue.PV 98-1
, pp. 468
-
-
Falster, R.1
Voronkov, V.V.2
Holser, J.C.3
Markgraf, S.4
McQuaid, S.5
Mule'Stagno, L.6
-
34
-
-
0343926339
-
-
A. J. R. de Kock, W. T. Stacy, and W. M. van der Wijgert, Appl. Phys. Lett., 34, 611 (1979).
-
(1979)
Appl. Phys. Lett.
, vol.34
, pp. 611
-
-
De Kock, A.J.R.1
Stacy, W.T.2
Van Der Wijgert, W.M.3
-
37
-
-
0021408318
-
-
P. Fahey, R. W. Dutton, and S. M. Hu, Appl. Phys. Lett., 44, 777 (1984).
-
(1984)
Appl. Phys. Lett.
, vol.44
, pp. 777
-
-
Fahey, P.1
Dutton, R.W.2
Hu, S.M.3
-
38
-
-
0023365167
-
-
J. C. C. Tsai, D. G. Schimmel, R. B. Fair, and W. Maszara, J. Electrochem. Soc., 134, 1508 (1987).
-
(1987)
J. Electrochem. Soc.
, vol.134
, pp. 1508
-
-
Tsai, J.C.C.1
Schimmel, D.G.2
Fair, R.B.3
Maszara, W.4
-
39
-
-
0023421894
-
-
J. C. C. Tsai, D. G. Schimmel, R. E. Ahrens, and R. B. Fair, J. Electrochem. Soc., 134, 2348 (1987).
-
(1987)
J. Electrochem. Soc.
, vol.134
, pp. 2348
-
-
Tsai, J.C.C.1
Schimmel, D.G.2
Ahrens, R.E.3
Fair, R.B.4
-
40
-
-
0008808781
-
-
T. Abe, W. M. Bullis, S. Kobayashi, W. Lin, and P. Wagner, Editors, The Electrochemical Society Proceedings Series, Pennington, NJ
-
M. Kikuchi, K. Tanahaslsi, and N. Inoue, in Defects in Silicon III. T. Abe, W. M. Bullis, S. Kobayashi, W. Lin, and P. Wagner, Editors, PV 99-1, p. 491, The Electrochemical Society Proceedings Series, Pennington, NJ (1999).
-
(1999)
Defects in Silicon III
, Issue.PV 99-1
, pp. 491
-
-
Kikuchi, M.1
Tanahaslsi, K.2
Inoue, N.3
-
41
-
-
0003767998
-
-
T. Abe, W. M. Bullis, S. Kobayashi, W. Lin, and P. Wagner, Editors, The Electrochemical Society Proceedings Series, Pennington, NJ
-
T. Ono, H. Horie, M. Miyazaki, H. Tyuya, and G. A. Rozgonyi, in Defects in Silicon III. T. Abe, W. M. Bullis, S. Kobayashi, W. Lin, and P. Wagner, Editors, PV 99-1, p. 300. The Electrochemical Society Proceedings Series, Pennington, NJ (1999).
-
(1999)
Defects in Silicon III
, Issue.PV 99-1
, pp. 300
-
-
Ono, T.1
Horie, H.2
Miyazaki, M.3
Tyuya, H.4
Rozgonyi, G.A.5
-
43
-
-
0031247354
-
-
E. Dornberger, D. Gräf, M. Suhren, U. Lambert, P. Wagner, F. Dupret, and W. von Ammon, J. Cryst. Growth, 180, 343 (1997).
-
(1997)
J. Cryst. Growth
, vol.180
, pp. 343
-
-
Dornberger, E.1
Gräf, D.2
Suhren, M.3
Lambert, U.4
Wagner, P.5
Dupret, F.6
Von Ammon, W.7
-
44
-
-
0018882683
-
-
F. Shimura, H. Tsuya, and T. Kawamura, J. Appl. Phys., 51, 269 (1980).
-
(1980)
J. Appl. Phys.
, vol.51
, pp. 269
-
-
Shimura, F.1
Tsuya, H.2
Kawamura, T.3
-
46
-
-
0028464432
-
-
H.-D. Chiou, Y. Chen, R. W. Carpenter, and J. Jeong, J. Electrochem. Soc., 141, 1856 (1994).
-
(1994)
J. Electrochem. Soc.
, vol.141
, pp. 1856
-
-
Chiou, H.-D.1
Chen, Y.2
Carpenter, R.W.3
Jeong, J.4
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