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Volumn 147, Issue 1, 2000, Pages 345-349

Phosphorus concentration limitation in Czochralski silicon crystals

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH FROM MELT; DISLOCATIONS (CRYSTALS); ELECTRIC CONDUCTIVITY OF SOLIDS; GRAIN BOUNDARIES; MELTING; PHOSPHORUS; SEMICONDUCTOR DOPING;

EID: 0033900487     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393198     Document Type: Article
Times cited : (31)

References (46)
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    • ASTM STP 850, D. C. Gupta, Editor, ASTM, Philadelphia
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  • 15
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    • (1998) Semiconductor Silicon 1998 , Issue.PV 98-1 , pp. 453
    • Hourai, M.1    Nishikawa, H.2    Tanaka, T.3    Umeno, S.4    Asayama, E.5    Nomachi, T.6    Kelly, G.7
  • 33
    • 0000289478 scopus 로고    scopus 로고
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    • R. Falster, V. V. Voronkov, J. C. Holser, S. Markgraf, S. Mcquaid, and L. Mule'Stagno, Semiconductor Silicon 1998. H. R. Huff, U. Gösele, and H. Tsuya, Editors, PV 98-1, p. 468. The Electrochemical Society Proceedings Series, Pennington. NJ (1998).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.