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Volumn 359, Issue 1, 2000, Pages 68-76
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Low temperature ZrB2 remote plasma enhanced chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ETCHING;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SUBSTRATES;
SYNTHESIS (CHEMICAL);
THERMOANALYSIS;
THIN FILMS;
X RAY ANALYSIS;
ZIRCONIA;
ZIRCONIUM ALLOYS;
POST-DISCHARGES;
REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD);
THERMAL CHEMICAL VAPOR DEPOSITION (CVD);
METALLIC FILMS;
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EID: 0033890283
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(99)00721-X Document Type: Article |
Times cited : (18)
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References (28)
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