Micromachined, shadow-mask technology for the OMVPE fabrication of integrated optical structures

Journal of Electronic Materials

Volumn 29, Issue 1, 2000, Pages 86-90

  Peake, G M ^a   Zhang, L ^a,b   Li, N Y ^c   Sarangan, A M ^a   Willison, C G ^b   Shul, R J ^b   Hersee, S D ^a  

^a University of New Mexico   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED OPTICS; METALLORGANIC VAPOR PHASE EPITAXY; MICROMACHINING;

SHADOW MASK TECHNOLOGY;

OPTICAL DEVICES;

EID: 0033882127     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-000-0100-x     Document Type: Article

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