Porous semiconductor micropatterns formed on focussed ion beam implants

Journal of Porous Materials

Volumn 7, Issue 1-3, 2000, Pages 233-237

  Schmuki, P ^a   Erickson, L E ^b   Lockwood, D J ^b  

^a EPFL   (Switzerland)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Integrated optics; Porous silicon; Wave guides

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL GROWTH; DISSOLUTION; ELECTROCHEMISTRY; INTEGRATED OPTICS; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; OPTICAL WAVEGUIDES; SEMICONDUCTOR GROWTH; SILICON WAFERS;

FOCUSED ION BEAMS (FIB); MICROPATTERNS;

POROUS SILICON;

EID: 0033881780     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1009655324979     Document Type: Article

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