Optimization of phase-modulated excimer-laser annealing method for growing highly-packed large-grains in Si thin-films

Applied Surface Science

Volumn 154, Issue , 2000, Pages 105-111

  Oh, Chang Ho ^a   Nakata, Mitsuru ^a   Matsumura, Masakiyo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; EXCIMER LASERS; GRAIN GROWTH; LASER APPLICATIONS; MASKS; OPTIMIZATION; PHASE MODULATION; PHASE SHIFTERS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH;

EXCIMER LASER CRYSTALLIZATION;

THIN FILM TRANSISTORS;

EID: 0033878873     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00477-8     Document Type: Article

References (6)

1. Matsumura M. Phys. Status Solidi A. 166:1998;715.
2. Crowder M.A., Carey P.G., Smith P.M., Sposili R.S., Cho H.S., Im J.S. IEEE Electron Device Lett. 19(8):1998;306.
3. Oh C.H., Ozawa M., Matsumura M. Jpn. J. Appl. Phys. 37:1998;L492.
4. Oh C.H., Matsumura M. Jpn. J. Appl. Phys. 37:1998;5474.
5. Matsumura M., Oh C.H. Thin Solid Films. 337:1999;123.
6. Ishikawa K., Ozawa M., Oh C.H., Matsumura M. Jpn. J. Appl. Phys. 37:1998;731.