Pulsed laser deposition and characterization of conductive RuO2 thin films

Journal of Materials Research

Volumn 12, Issue 6, 1997, Pages 1433-1436

  Iembo, A ^a   Fuso, F ^a   Arimondo, E ^a   Ciofi, C ^a   Pennelli, G ^a   Curro G M ^b   Neri, F ^b   Allegrini, M ^b  

^a UNIVERSITY OF PISA   (Italy)

^b UNIVERSITY OF MESSINA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; INTERFACES (MATERIALS); PULSED LASER APPLICATIONS; RUBIDIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SURFACE PROPERTIES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CONDUCTIVE THIN FILMS; FILM SUBSTRATE INTERFACE; PULSED LASER DEPOSITION; RUBIDIUM OXIDES;

CONDUCTIVE FILMS;

EID: 0031162740     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0195     Document Type: Article

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