Silicon wafer subsurface characterization with blue-laser/microwave and UV-laser/millimeter-wave photoconductivity techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3509, Issue , 1998, Pages 65-73

  Ogita, Yoh Ichiro ^a   Shinohara, Hiroshi ^a   Sawanobori, Tsuyoshi ^a   Kurokawa, Masaki ^a  

^a KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ar laser; Chemomechanical polish; Gate oxide integrity; Microwave; Millimeter wave; Minority carrier lifetime; Photoconductivity decay; Silicon wafer; Subsurface damage; UV laser

Indexed keywords

CHEMICAL POLISHING; LASERS; MILLIMETER WAVES; PHOTOCONDUCTIVITY; ULTRAVIOLET RADIATION;

BLUE LASER; INITIAL CARRIER LIFETIME; PHOTOCONDUCTIVITY AMPLITUDE; ULTRAVIOLET LASER;

SILICON WAFERS;

EID: 0032404880     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324421     Document Type: Conference Paper

References (15)

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