Mirror-polishing residual damage characterization in the subsurface of Si wafers using N2 laser/mm-wave photoconductivity amplitude technique

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 209-214

  Ogita, Y ^a   Hosoda, Y ^a   Miyazaki, M ^a  

^a KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GAS LASERS; GATES (TRANSISTOR); MILLIMETER WAVES; OXIDES; PHOTOCONDUCTIVITY; POLISHING; SURFACE ROUGHNESS;

MIRROR POLISHING; PHOTOCONDUCTIVITY AMPLITUDE TECHNIQUE;

SILICON WAFERS;

EID: 0030655408     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)