Implantation of group IVA elements in TiO2: lattice site location and diffusion

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 528-533

  Fromknecht, R ^a   Khubeis, I ^b   Meyer, O ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b AL BALQA APPLIED UNIVERSITY   (Jordan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL DEFECTS; CRYSTAL IMPURITIES; CRYSTAL LATTICES; DIFFUSION IN SOLIDS; GERMANIUM; LEAD; POSITIVE IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; TIN; TITANIUM DIOXIDE;

CHANNELING; LATTICE DISORDER;

ION IMPLANTATION;

EID: 0033872827     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00839-3     Document Type: Article

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