Ion implantation in TiO2: Effect of the charge state on the lattice site occupation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 136-138, Issue , 1998, Pages 436-441

  Meyer, O ^a   Khubeis, I ^b   Fromknecht, R ^a   Massing, S ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF JORDAN   (Jordan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; CRYSTAL LATTICES; DOPING (ADDITIVES); ION IMPLANTATION; LEAD; MERCURY (METAL); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUPERSATURATION;

CHARGE COMPENSATION; LATTICE SITE OCCUPATION;

TITANIUM DIOXIDE;

EID: 0032017219     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00866-5     Document Type: Article

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